HU LI

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 9:00 AM - 12:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

12:00 PM - 12:15 PM

△ [20a-438-12] Numerical Analysis for Reactions of TEOS and SiO₂ in Plasma Enhanced CVD

〇HU LI¹, Satoru Kawaguchi^2,3, Hisashi Higuchi¹, Kazuki Denpoh¹, Kohki Satoh² (1.TTS, 2.Muroran Inst. Tech., 3.JSPS Research Fellow)