Hiroki Izumisawa

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)

Poster presentation
| 8 Plasma Electronics
| 8.3 Plasma nanotechnology

[21p-PB2-1~5] 8.3 Plasma nanotechnology

1:30 PM - 3:30 PM

[21p-PB2-1] Influences of Substrate Surface Morphologies on Deposition Rates
in Glancing-angle Reactive Sputtering

〇(M2)Hiroki Izumisawa¹, Masashi Hosoya¹, Yasusi Inoue¹, Osamu Takai² (1.Chiba Tec., 2.Kangaku Univ.)