Yoshiki Iizawa

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:15 PM - 7:30 PM 222 (222)

Oral presentation
| 6 Thin Films and Surfaces
| 6.2 Carbon-based thin films

[20p-222-1~23] 6.2 Carbon-based thin films

6:00 PM - 6:15 PM

[20p-222-18] Fabrication and structural analysis of high-nitrogen containing a-CNx:H thin films using the radio-frequency plasma CVD of the gas mixture of the organic compound, N₂ and Ar

〇Yoshiki Iizawa¹, Hidetoshi Saito¹, Haruhiko Ito¹ (1.Nagaoka Univ of Tech)