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[18a-145-6] Growth mechanism of DPh-DNTT films prepared by vacuum deposition
Keywords:DPh-DNTT, OTFT
Recently, Diphenyl-Dinaphthothienothiophene (DPh-DNTT) is receiving a lot of attention as a new organic material for organic transistor due to it high mobility and stability. Although the thin film of DPh-DNTT can be prepared by vacuum deposition, the influence of deposition condition on the growth mechanism or crystallinity has not been clarified yet. We investigated the growth mechanism of DPh-DNTT by depositing atomically thin film on the thermally oxidized silicon substrate. Initially, the two-dimensional islands nucleate on the surface. These nucleations grow horizontally. After completion of the first layer, second layer also grow similarly. We observed the layer-by-layer growth.