1:15 PM - 1:30 PM
[18p-235-1] Formation and Optoelectronic Characterization of High-Si-Content Strain-Relaxed Ge1-x-ySixSny/Ge1-xSnx/Ge1-x-ySixSny Double-Heterostructure
Keywords:semiconductor, GeSiSn, GeSn
Oral presentation
15 Crystal Engineering » 15.5 Group IV crystals and alloys
Tue. Sep 18, 2018 1:15 PM - 5:00 PM 235 (3F_Lounge2)
Keisuke Arimoto(Univ. of Yamanashi), Katsunori Makihara(Nagoya Univ.)
1:15 PM - 1:30 PM
Keywords:semiconductor, GeSiSn, GeSn