[18p-PA2-1~20] 6.4 Thin films and New materials

[18p-PA2-16] Fabrication of far-infrared filter consisting of Ge/Na₃AlF₆ using SiO cap layer

〇Koichi Muro¹ (1.Asahi Spectra Co., Ltd.)

Keywords:optical filter, far infrared rays, evaporation

The optical filter uses light wave interference. As the target wavelength becomes longer, the optical film thickness becomes thicker, so problems such as peeling due to stress when a fabrication by evaporation. We found the effect of peeling suppression by SiO cap layer on the Na₃AlF₆ ultra-thick film constituting the far-infrared filter. And, by inserting SiO layer into a multilayer film consisting of Ge/Na₃AlF₆, suppression of peeling was confirmed. A filter for alternative freon (HFC) gas was fabricated, and gas imaging was achieved with thermal camera.