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[18p-PB3-82] NaCl-Assisted CVD Synthesis of WS2 Atomic Layers from H2S and WF6 Precursors
Keywords:Transition metal dichalcogenides, CVD
The CVD growth method is commonly used for obtaining large-scale, atomic layered transition-metal dicalcogenides such as MoS2 and WS2. In a typical CVD growth method, solid powder precursors like metal oxide and elemental sulfur are used to obtain them. Since these precursors are solid, it is difficult to control their supply rate, leading to lowering reproducibility of CVD growth.
Here, we report the NaCl-assited CVD synthesis of WS2 atomic layers from H2S and WF6 precursors. These compounds are gas phase, and their supply rate can be precisely controlled by mass flow controller. With the assistance of NaCl, we succeeded to obtain WS2 atomic layers on SiO2/Si substrate from these gas phase precursors .
Here, we report the NaCl-assited CVD synthesis of WS2 atomic layers from H2S and WF6 precursors. These compounds are gas phase, and their supply rate can be precisely controlled by mass flow controller. With the assistance of NaCl, we succeeded to obtain WS2 atomic layers on SiO2/Si substrate from these gas phase precursors .