10:45 AM - 11:00 AM
[19a-233-7] Numerical Simulation Concerning Dopant Concentration Measurements by ∂C/∂z-SNDM
Keywords:semiconductor, dopant concentration, scanning probe microscopy
Presentation information
Oral presentation
13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
[19a-233-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
Wed. Sep 19, 2018 9:00 AM - 12:00 PM 233 (233)
Reo Kometani(Univ. of Tokyo)