The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[19a-233-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

Wed. Sep 19, 2018 9:00 AM - 12:00 PM 233 (233)

Reo Kometani(Univ. of Tokyo)

10:45 AM - 11:00 AM

[19a-233-7] Numerical Simulation Concerning Dopant Concentration Measurements by ∂C/∂z-SNDM

Yoshiomi Hiranaga1, Yasuo Cho1 (1.RIEC. Tohoku Univ.)

Keywords:semiconductor, dopant concentration, scanning probe microscopy