[19a-311-1~12] 17.3 Layered materials

[19a-311-12] Influence of Focused Ion Beam Etching on Exfoliated Thin Films of Layered Material NbSe2

〇Hikari Tomori¹, Naoki Hoshi¹, Daisuke Yabe¹, Kenji Watanabe², Takashi Taniguchi², Akinobu Kanda¹ (1.Univ. Tsukuba, 2.NIMS)

Keywords:layered materials, chalcogenide

We investigated the influence of the microfabrication using focused ion beam (FIB) on the electron transport of exfoliated thin films of superconducting transition metal dichalcogenide NbSe₂. We observed dramatic decrease of the superconducting temperature and the Josephson-junction-like current-voltage characteristics at low temperatures. Our results indicate that the FIB etching induces cracks in NbSe₂ thin films and adjacent segments are separated with tunnel barriers.