[19a-PA4-1~13] 3.7 Laser processing

[19a-PA4-4] Patterning Oxidation of Copper Substrate by Femtosecond Laser Irradiation

〇Xi Yu¹, Masaaki Sudo², Fumihiro Itoigawa¹, Shingo Ono¹ (1.Nitech, 2.IMRA America, Inc.)

Keywords:femtosecond laser processing, Fine patterning oxidation

Patterning oxidation was performed by irradiating femtosecond laser pulses to surface of oxygen-free copper substrate. Conglomerations less than 1 µm were observed by SEM. Expansion (about 400 nm) and discoloration of irradiated area were observed by CLSM. By Raman spectroscopy, peaks attributed to copper oxide (Cu₂O: 219 cm^-1, CuO: 298 cm^-1) were observed. Results of EDX show that oxygen is relatively uniformly distributed on the sample treated at 25 mW, comparing with samples treat at 10 mW and 50 mW. About the results of XRD, peaks attributed to Cu (2 0 0) and Cu (2 2 0) decreased, and the peak attributed to Cu₂O (1 1 1) and CuO (-1 1 3) were observed.