[19p-212A-1~11] 3.14 Optical control devices and optical fibers

[19p-212A-4] Optical Properties of microring resonators using cat-CVD SiN films

〇Kentaro Furusawa¹, Yoshimi Yamashita¹, Kanna Aoki¹, Norihiko Sekine¹, Akifumi Kasamatsu¹, Yoshinori Uzawa² (1.NICT, 2.NAOJ)

Keywords:Silicon Nitride, Microring resonators, Catalytic chemical vapor deposition

We examined the performance of catalytic chemical vapor deposition (cat-CVD) based SiN films by fabricating microring resonators using them. High Q resonators with the free spectral range of 476 GHz, the loaded quality factor~1.6x10^5, and the peak extinction ratio of 10 dB were obtained at the telecommunication L band. The results highlight that cat-CVD SiN films are suitable options for fabricating low-loss and low-stressed photonics devices, thanks to their low hydrogen content as well as the low deposition temperature.