3:15 PM - 3:30 PM
[19p-234A-7] UV nanoimprint by water soluble polymer pattern as intermediate mold
Keywords:UV nanoimprint, water soluble polymer
UV nanoimprint process by use of water soluble polymer pattern as intermediate mold is developed. Even when the water soluble resin is stuck to the original mold, the residual resin can be easily removed in water. Moreover, since the intermediate mold can be dissolved in water, no demolding process is necessary in the UV nanoimprint process.