[19p-431B-1~18] 3.5 Laser system and materials

[19p-431B-13] Temperature dependence of laser-induced damage by multiple pulses irradiation for silica glass

〇(M1)Haruka Ogawa^1,3, Shinji Motokoshi², Masashi Yoshimura³, Takahisa Jitsuno³, Kana Fujioka³, Masayuki Imanishi¹, Yusuke Mori¹ (1.Grad. Sch. of Eng., Osaka Univ., 2.Inst. for Laser Tech., 3.ILE Osaka Univ.)

Keywords:Laser-induced damages, Ultraviolet light, Temperature dependence

Our purpose is to clear the damage mechanism of optical devices by multiple pulses irradiation and to improve their damage resistances. In this work, transmittances by ArF excimer laser (193 nm, 10 ns, and 100-Hz pulse rate) irradiation for silica glass kept at different temperature were estimated. As results, the lowering of transmittance was inhibited by heating the sample. Our presentation will also report the results of damage threshold for heated samples.