[19p-437-1~15] 9.5 New functional materials and new phenomena

[19p-437-14] Controlled mesopore structures on silicon nanoparticle surfaces by etching conditons

〇Taisuke Kuga¹, Keisuke Sato¹ (1.Tokyo Denki Univ.)

Keywords:semiconductor, mesopore, silicon nanoparticle

In recent years, semiconductor nanoparticles having mesopores have been applied to various kinds such as storage batteries and cell adsorbing materials. As a technique for forming mesopores, we investigeted a method of forming mesopores on the surface of silicon nanoparticles using a wet etching method which is an inexpensive and convenient method. In this presentation, we will present the specific surface area and size distribution of mesopores with respect to etching time.