Hard X-ray Photoelectron Spectroscopy Analysis of MoO<sub>x</sub>/SiO<sub>2</sub>/Si Interfaces

Takefumi Kamioka; Satoshi Yasuno; Hyunju Lee; Takuto Kojima; Tappei Nishihara; Yutaka Hayashi; Kyotaro Nakamura; Yoshio Ohshita; Atsushi Ogura

Presentation information

Poster presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[19p-PA5-1~14] 16.3 Bulk, thin-film and other silicon-based solar cells

Wed. Sep 19, 2018 1:30 PM - 3:30 PM PA (Event Hall)

1:30 PM - 3:30 PM

[19p-PA5-8] Hard X-ray Photoelectron Spectroscopy Analysis of MoO_x/SiO₂/Si Interfaces

〇(PC)Takefumi Kamioka^1,2, Satoshi Yasuno³, Hyunju Lee², Takuto Kojima¹, Tappei Nishihara¹, Yutaka Hayashi², Kyotaro Nakamura², Yoshio Ohshita², Atsushi Ogura¹ (1.Meiji Univ., 2.TTI, 3.JASRI)

Keywords:MoOx, interface, HAXPES

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Presentation information

[19p-PA5-1~14] 16.3 Bulk, thin-film and other silicon-based solar cells

[19p-PA5-8] Hard X-ray Photoelectron Spectroscopy Analysis of MoOx/SiO2/Si Interfaces

[19p-PA5-8] Hard X-ray Photoelectron Spectroscopy Analysis of MoO_x/SiO₂/Si Interfaces