The 79th JSAP Autumn Meeting, 2018

Presentation information

Poster presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[19p-PB1-1~37] 6.3 Oxide electronics

Wed. Sep 19, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)

1:30 PM - 3:30 PM

[19p-PB1-1] Semiconductor Thin Films for Transparent Solar Cell fabricated by
Dual Source Simultaneous Electron Beam Vacuum Deposition Method

Hiroshi Morita1, Masaya Hirano1, Kazuya Goda1 (1.Sanyo-onoda City Univ.)

Keywords:Solar Cell, Vacuum Deposition Method

We found and reported that the photovoltaic performance of a transparent thin film solar cell by adding Li to the p-typed transparent semiconductor NiO. After that, we applied the dual source simultaneous vacuum deposition method which was conventionally used for the thin film formation of alloys and compounds, to investigate the optimum contain amounts of Li. Initially, we theoretically clarified the method for obtaining a complex film with a desired addition atom amount. Successively, we actually formed the complex films and were able to achieve the optimum p-type semiconductor thin film to improve the solar cell power generation efficiency. In order to obtain the better semiconductor characteristics, we also plan to use this method for examining other element addition to NiO.