The 79th JSAP Autumn Meeting, 2018

Presentation information

Poster presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[19p-PB1-1~37] 6.3 Oxide electronics

Wed. Sep 19, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)

1:30 PM - 3:30 PM

[19p-PB1-16] Investigation of Hydrogen-Free SiO2-PECVD for Functional Metal-Oxide Materials

Hideaki Zama1, Tadamasa Kobayashi1 (1.ISM, ULVAC,Inc.)

Keywords:PECVD, SiO2, hydrogen-free

We evaluate the SiO2-PECVD process without reducibility by using a raw material not containing hydrogen for functional metal-oxide materials.