The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[20a-135-1~9] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

Thu. Sep 20, 2018 9:00 AM - 11:30 AM 135 (135)

Takashi Uchino(Kobe Univ.), Akira Saitoh(Ehime Univ.)

9:30 AM - 9:45 AM

[20a-135-3] Valence change behavior of Cu ions in oxide glasses by gamma ray irradiation

Ryo Hashikawa1, Atsushi Kinomura2, Takeshi Saito2, Arifumi Okada1, Takashi Wakasugi1, Kohei Kadono1 (1.Kyoto Inst. Tech., 2.KURNS)

Keywords:copper, gamma ray irradiation, oxide glasses

When the glass is irradiated with radiation, an electron-hole pair is generated in the glass. It is known that a part of the electron-hole pair is captured by metal ions in the glass and the valence of the metal ion changes. Utilizing this phenomenon, the amount of ions of luminescent species in the glass can be increased after irradiation, and a new luminescent is created. This emission is called radiophotoluminescence (RPL) and is applied to fluorescent glass for personal dosimeters. In fluorescent glass for personal dosimeters, since the emission intensity are proportional to the exposure dose, the exposure dose can be estimated from the measurement of the emission intensity. Whereas the Ag-activated phosphate glass is in practical use at present, we have focused on Cu belonging to the same group as Ag and found that RPL is also induced in Cu-doped glass. In this presentation, we attempted quantitative evaluation on the relationship among valence change, absorbed dose, and RPL intensity of Cu ions when the glass is exposed to radiation.