[20a-234B-1~10] 22.1 Joint Session M "Phonon Engineering"

[20a-234B-5] Evaluating heat diffusion in thin films and interfacial thermal resistance by pulsed light heating thermoreflectance method

〇Takahiro Baba¹, Kazuko Ishikawa¹, Tetsuya Baba² (1.PicoTherm Corp., 2.AIST)

Keywords:thermoreflectance, interfacial thermal resistance

The pulsed light heating thermoreflectance method is one of the popular choice to measure thermal diffusivity of thin films. Thermophysical property values such as thermal diffusivity is determined by fitting an analytical equation to observed thermoreflcetance signal. It is primarily important to select an suitable mathematical model from which the equation is derived. This study proposes a new model which considers the effect of periodic pulse heating and interfacial thermal resistance simultaneously.