[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [20a-438-5] Production process of ions in high power pulse sputtering discharge using titanium target

〇(M2)Kazunori Iga¹, Takayuki Ohta¹ (1.Meijo Univ.)

Keywords:high power impulse magnetron sputtering, energy-resolved mass spectrometry

In high power pulsed sputtering, which can realize high ionization rate and produce high energy ion, the energy distributions of Ar⁺ and Ti⁺ were measured with energy-resolved mass spectrometry and ionization process of sputtered species and gas species will be discussed. With increasing pulse width, total ion number of Ti⁺ increased and the peak of the high energy Ar⁺ was appeared. It is considered that recoiled Ar from the target was incident on the film.