[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [20a-438-6] Tribological properties of Si-doped DLC film deposited by dual magnetron sputtering

〇(M2)Yuki Miwa¹, Akinori Oda², Hiroyuki Kousaka³, Takayuki Ohta¹ (1.Meijo Univ., 2.Chiba Inst. Technol., 3.Gifu Univ.)

Keywords:Si-DLC, sputtering, low friction

It has been reported that the silicon-doped DLC (Si-DLC) film exhibits low friction coefficient than the non-doped DLC film. In addition, a hydrogen-free DLC film deposited by using the physical vapor deposition method can also realize the reduction of the friction coefficient.
In this study, hydrogen-free Si-DLC films was deposited by dual magnetron sputtering method using carbon and silicon targets. Friction property of hydrogen-free Si-DLC film was evaluated.
It was suggested that when the Si content in the film becomes excessive, the structure of the DLC film becomes disordered and becomes a film which easily wears off.