[20a-PA1-1~11] 7 Beam Technology and Nanofabrication (Poster)

[20a-PA1-9] Optimization of mirror magnetic fields on a permanent magnet ECR ion source for the aluminum multi-charged ions generation

〇(B)Shoki Kono¹, Sinji Yamada¹, Tsubasa Nakamura¹, Toyohisa Asaji², Muneo Furuse¹ (1.NIT, Oshima, 2.NIT, Toyama)

Keywords:ECR ion source, mirror magnetic field, aluminum multi-charged ion

In late years the ion injection to dope impurities becomes the indispensable technique. A power semiconductor market makes rapid progress in that. A study using a multi-charged ion advances to lower the acceleration voltage of the device in the ion-injection industry. Therefore, we inspect the optimum on producing an aluminum multi-charged ion in this study. In addition, we inspect the ionization about the influence of the mirror magnetic field and the optimization etc.