[20a-PB9-1~14] 6.2 Carbon-based thin films

[20a-PB9-8] Characterization of Carbon nitride thin films prepared by reactive sputtering

〇(M1)Daiki Yoshida¹, Naoki Ohtani¹ (1.Doshisha Univ.)

Keywords:thin film, carbon nitride, sputtering

The target carbon (C), to prepare a carbon nitride thin film by reactive sputtering using nitrogen (N₂) as a reactive gas. Then, the shape evaluation such as film thickness and surface observation, by performing the analysis of the bond present in the thin film using the FT-IR, etc., the carbon nitride thin film produced by reactive sputtering shows the characteristics of what I want to clarify.