The 79th JSAP Autumn Meeting, 2018

Presentation information

Print

Symposium (Oral)

Symposium » Trends of ferroelectric HfO2 technologies

[20p-141-1~13] Trends of ferroelectric HfO2 technologies

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Tomoaki Yamada(Nagoya Univ.), Shosuke Fujii(Toshiba Memory)

2:00 PM - 2:30 PM

[20p-141-2] Formation of ferroelectric HfxZr1-xO2 thin films using ZrO2-seed layer

〇Toshihide Nabatame1, Takashi Onaya1,2,3, Naomi Sawamoto2, Akihiko Ohi1, Naoki Ikeda1, Atsushi Ogura2 (1.NIMS, 2.Meiji University, 3.JSPS Research Fellow)

Keywords:Ferroelectric HfZrO, ZrO2-seed, ALD