The 79th JSAP Autumn Meeting, 2018

Presentation information

Symposium (Oral)

Symposium » Trends of ferroelectric HfO2 technologies

[20p-141-1~13] Trends of ferroelectric HfO2 technologies

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Tomoaki Yamada(Nagoya Univ.), Shosuke Fujii(Toshiba Memory)

3:45 PM - 4:00 PM

[20p-141-7] Trace of Phase Transformation in Hf-Zr-O Films Investigated by Low-Temperature and Long-Time Annealing

Shinji Migita1, Hiroyuki Ota1, Keisuke Shibuya1, Hiroyuki Yamada1, Akihito Sawa1, Takashi Matsukawa1, Akira Toriumi2 (1.AIST, 2.Univ. Tokyo)

Keywords:ferroelectric, HfO2, phase transformation

Phase transformation of Hf-Zr-O thin films are examined by the low-temeprature and long-time anneal, which enables to trace the evolution of crystalline phases in the process of crsytallization. We studied the changes of crystal structures and dielectric properties in 10-nm-thick Hf0.5Zr0.5O2 thin films.