[20p-146-1~9] 8.4 Plasma life sciences

△ [20p-146-6] Improvement in Suppression Effect of Plasma-Exposed-Solution with externally supplied plasma effluent gas on C.glo Conidia Germination

〇(M2)Kenji Nihei¹, Keisuke Takashima¹, Toshiro Kaneko¹ (1.Graduate School of Engineering,Tohoku Univ.)

Keywords:Plasma-Exposed-Solution, plasma effluent gas, gas-liquid interfacial plasma

A plasma jet device spraying Plasma-Exposed-Solution has been developed, which is expected to enable to generate high concentration of liquid phase short-lived reactive species by the direct contact with the plasma and to transport the generated reactive species to objects in a short time. Since it was suggested that the peroxynitric acid can be generated by N₂O₅ in the gas phase and H₂O₂ in the liquid phase, when we introduced an air plasma effluent gas into the plasma jet device, the germination suppression effect of C.glo conidia was improved. Therefore, the reactive species in the gas phase might be involved in the generation of the short-lived reactive species in the liquid phase, which might affect the germination.