[20p-212A-1~16] 3.9 Terahertz technologies

△ [20p-212A-11] Improvement of THz Moth-Eye Antireflective Structures Fabricated by Femtosecond Laser Processing

〇Xi Yu¹, Naoki Horita¹, Masaaki Sudo², Shingo Ono¹, Jongsuck Bae¹ (1.Nitech, 2.IMRA America, Inc.)

Keywords:femtosecond laser processing, terahertz anti-reflective structure

Terahertz antireflective structures on Si and GaAs substrates are fabricated by femtosecond laser processing. The structure is constituted by periodic grooves or tapers at micro order. Their antireflective characteristics are evaluated by THz-TDS (terahertz time-domain spectroscopy), and the results show that the surface reflectance is almost decreased to 0 and antireflection band was widened by improving aspect ratio. Additionally, the power reflectance calculated by HFSS matched the experiment results very well.