2:15 PM - 3:00 PM
▲ [20p-223-2] ALD trend and its application to gate spacer and charge trap layer
Keywords:ALD
Presentation information
Symposium (Oral)
Symposium » Current status and future prospect of atomic layer processes
[20p-223-1~11] Current status and future prospect of atomic layer processes
Thu. Sep 20, 2018 1:45 PM - 6:45 PM 223 (223)
Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Daisuke Hojo(AIST), Kazuhiro Karahashi(Osaka univ.)