The 79th JSAP Autumn Meeting, 2018

Presentation information

Symposium (Oral)

Symposium » Advanced ion microscopy for future nanoelectronics materials and devices

[20p-233-1~10] Advanced ion microscopy for future nanoelectronics materials and devices

Thu. Sep 20, 2018 1:30 PM - 6:00 PM 233 (233)

Reo Kometani(Univ. of Tokyo), Shinichi Ogawa(AIST)

2:15 PM - 2:45 PM

[20p-233-3] Graphene nanoelectromechanical (GNEM) devices functionalized by using helium ion beam for nanoscale thermal engineering

Hiroshi Mizuta1,4, Mayeesha Hauqe1, Seiya Kubo1, Mikio Koyano1, Yoshifumi Oshima1, Manoharan Muruganathan1, Yusuke Arashida2, Ikufumi Katayama2, Jun Takeda2, Shinichi Ogawa3, Marek Schmidt1 (1.JAIST, 2.YNU, 3.AIST, 4.Hitachi Cambridge Lab)

Keywords:graphene, phononic crystal, nanofabrication

We report on our recent progress of single-nanometer-scale patterning of suspended graphene structures by using focused helium ion beam of sub-1-nm in diameter and their applications to heat phonon engineering. We demonstrate the technique to fabricate graphene phononic crystals (GPnCs) with the two-dimensional array of 3-4 nm pores with the pitch down to 10 nm on multi-scale suspended graphene channels ranging from 100 nm to a few microns in length and width. We also briefly introduce simulation and characterization techniques for electronic and phonic states in GPnCs and discuss the possibility of GPnC-based thermal rectification devices.