2018年第79回応用物理学会秋季学術講演会

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22 合同セッションM 「フォノンエンジニアリング」 » 22.1 合同セッションM 「フォノンエンジニアリング」

[20p-234B-1~17] 22.1 合同セッションM 「フォノンエンジニアリング」

2018年9月20日(木) 13:15 〜 18:00 234B (234-2)

渡邉 孝信(早大)、山本 貴博(東理大)、宇治原 徹(名大)

16:00 〜 16:15

[20p-234B-11] Heavy-element dependence of thermoelectric properties in Fe2VAl thin films

〇(PC)Seongho Choi1、Satoshi Hiroi2、Dogyun Byeon1、Masaharu Matsunami1、Tsunehiro Takeuchi1 (1.Toyota Tech. Inst.、2.NIMS.)

キーワード:Heusler compounds, Thin film, Time-domain thermoreflectance

Heusler-type Fe2VAl-based compounds consisting of non-toxic and abundant materials have been widely investigated as one of the most promising thermoelectric materials. Although its power factor reaches 5.5 mWm-1K-2 which is even larger than that of Bi2Te3-based thermoelectric materials, the figure of merit is still much less than unity due to the high lattice thermal conductivity of more than 20 W m-1K-1. As for that, we tried to reduce the thermal conductivity through two approaches, doping control using heavy elements and fabricating thin films which successfully decreased to 7.2 and 12.6 Wm-1K-1, respectively.1,2 In the present study, we intended to enhance the thermoelectric properties by doping Ta in in the Fe2VAl-based thin films, that is, by combining the both approaches.