The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

8 Plasma Electronics » 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[21a-136-1~12] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

Fri. Sep 21, 2018 9:00 AM - 12:15 PM 136 (3F_Lobby)

Fumiyoshi Tochikubo(Tokyo Metropolitan Univ.), Tatsuo Ishijima(Kanazawa Univ.)

9:45 AM - 10:00 AM

[21a-136-4] Kinetic analysis of plasma-mediated catalysis of CH4/CO2 reforming

Shen Zunrong1, Kenta Sakata1, Seigo Kameshima1, 〇Tomohiro Nozaki1 (1.Tokyo Tech)

Keywords:Plasma Catalysis, Dielectric Barrier Discharge, Catalysis and Catalyst

In the CH4/CO2 reforming reaction, when Dielectric Barrier Discharge (DBD) is superimposed on the Ni/ Al2O3 catalyst packed bed, the conversion rate increases significantly for both CH4 and CO2 under the constant catalyst temperature. Dissociation of a stable C-H bond is known to be the rate-liming step; therefore, accelerating the CH4 conversion rate by DBD is extremely useful for increasing the overall reaction rate. In this paper, the kinetic analysis of the plasma catalysis of CH4/CO2 reforming reaction was carried out in order to identify the key step for nonthermal plasma induced reaction enhancement mechanism.