[21a-235-1~8] 7.1 X-ray technologies

[21a-235-3] Improvement of reflectivity of MEMS X-ray optical system by chemical mechanical polishing

〇Maiko Fujitani¹, Yuichiro Ezoe¹, Kumi Ishikawa², Aoto Fukushima¹, Masaki Numazawa¹, Daiki Ishi¹, Ryota Otsubo¹, Hikaru Suzuki¹, Hikaru Nagatoshi¹, Tatsuya Yuasa¹, Takaya Ohashi¹, Kazuhisa Mitsuda² (1.TMU, 2.JAXA/ISAS)

Keywords:X-ray optical system, chemical mechanical polishing, Micromachine technology