2018年第79回応用物理学会秋季学術講演会

講演情報

シンポジウム(口頭講演)

シンポジウム » 日韓の有機エレクトロニクス研究II:基礎研究と応用研究の視点から

[21p-141-1~8] 日韓の有機エレクトロニクス研究II:基礎研究と応用研究の視点から

2018年9月21日(金) 13:30 〜 17:45 141 (141+142)

石井 久夫(千葉大)、臼井 博明(農工大)

16:15 〜 16:45

[21p-141-6] Charge behavior of organic semiconductor devices with nano-structured interface

Eunju Lim1、Moonjeong Bok1、Sungjib Jo1、Young Seok Song1 (1.Dankook Univ.)

キーワード:Organic semiconductor, Nano-pattern

Since the discovery of organic semiconductor materials, organic material and device processing technology has advanced by improvements in carrier mobility, device stability and so on. The advanced technology has been utilized in Research and Developments (R&D) on organic field effect transistors, organic light emitting diodes, organic solar cells, and so forth. Many theoretical and experimental studies on carrier mechanisms have been carried out to realize low-cost processing and flexible circuitry. However, these studies are still not sufficient for the use of organic semiconductors in actual organic devices which have advantage characteristics in comparing with inorganic devices. To improve the organic device efficiency, nanotechnology has been employed. In this study, we used periodic nano-patterning electrode to improve organic device characteristics by using nanoimprint lithography technique. First, we analyzed the cross section image of nano-patterned organic device to see pattern formation, and then studied the charge behavior that arises due to the presence of nano-pattern together with nano-size. The condition of pattern-size was regulated in the region from 100 to 200 nm, and we optimized the pattern using Focused Ion beam. To evaluate the dependence of the pattern and size on the organic device performance, we measured the electric characteristics of devices, on focusing carrier injection and transport. By adjusting the patterning size to control contact of metal and organic semiconductor, we controlled the charge injection and transport of devices. Our fabricated nano-pattern organic device has a low contact resistance. We, therefore, anticipate that our idea of using nano-pattern will lead to a new way for contact engineering.