[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-7] Development of rotational cross-shaped RF magnetron sputtering system for improving target utilization

〇(M1)Rei Tanaka¹, Yasunori Ohtu¹, Yutaro Nakamura¹ (1.Saga Univ.)

Keywords:sputtering, magnetron, plasma