[21p-PB2-1~5] 8.3 Plasma nanotechnology

[21p-PB2-1] Influences of Substrate Surface Morphologies on Deposition Rates
in Glancing-angle Reactive Sputtering

〇(M2)Hiroki Izumisawa¹, Masashi Hosoya¹, Yasusi Inoue¹, Osamu Takai² (1.Chiba Tec., 2.Kangaku Univ.)

Keywords:Sputtering