[17a-F206-1~13] 13.3 絶縁膜技術

▲ [17a-F206-8] Heat treatment in liquid water at 80^oC used to improve the interface characteristic of metal-oxide-semiconductor capacitor

〇Yoshito Hirokawa¹、Masahiko Hasumi¹、Toshiyuki Samesima¹、Tomohisa Mizuno² (1.TUAT、2.Kanagawa Univ.)

キーワード：Metal-Oxide-Semiconductor capacitor, Passivation of silicon surface