2018年第65回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

3 光・フォトニクス » 3.12 ナノ領域光科学・近接場光学

[17p-A402-1~18] 3.12 ナノ領域光科学・近接場光学

2018年3月17日(土) 13:30 〜 18:30 A402 (54-402)

久保 敦(筑波大)、高原 淳一(阪大)

18:15 〜 18:30

[17p-A402-18] Near-field Coupling between Double-layer Metallic Patterns

〇(PC)Zhengli Han1、Seigo Ohno2、Yu Tokizane1、Kouji Nawata1、Takashi Notake1、Yuma Takida1、Hiroaki Minamide1 (1.Riken、2.Tohoku Univ.)

キーワード:Near-field coupling, double-layer metallic patterns, metamaterial

Near-field coupling plays an essential role in near-field optics, such as the near-field scanning optical microscope (NSOM). Optimized near-field coupling can efficiently improve the system or device performance. In the metamaterial with subwavelength metallic structures, the control of the near-field coupling in between metallic patterns, especially in between difference layers of metallic patterns, can bring novel functionalities to metamaterial devices for optics. In this paper, we analyze the near-field coupling within a unit of double-layer metallic patterns to show a new strategy for metamaterial devices in terahertz (THz) optics.