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[17p-D102-16] Sputter-deposition of Al top electrode films of OLED under an infrared irradiation
Keywords:organic light emitting device, sputter-deposition, infrared irradiation
Sputter-deposition of Al top electrode films of OLED under an infrared irradiation was attempted by using a Facing Target type low damage sputtering system. As a result, it was found that the luminance characteristics of the OLED depend on the infrared irradiation conditions and the OLED fabricated by the sputtering method has almost similar operating characteristics of the OLED fabricated by evaporation method if the infrared irradiation conditions were optimized. These results indicates that the sputter-deposition process of top electrode film is useful for the fabrication of OLED.