The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

9 Applied Materials Science » 9.5 New functional materials and new phenomena

[17p-F202-1~12] 9.5 New functional materials and new phenomena

Sat. Mar 17, 2018 1:45 PM - 5:15 PM F202 (61-202)

Kouichi Takase(Nihon Univ.), Satoshi Matsuishi(Tokyo Institute of Technology), Takayuki Nakane(NIMS)

2:15 PM - 2:30 PM

[17p-F202-3] Gate Control of the Surface Conduction of a Bulk-resistive Topological Insulator

Tetsuro Misawa1,2, Yasuhiro Fukuyama2, Shuji Nakamura2, Yuma Okazaki2, Nariaki Nasaka1, Nobu-Hisa Kaneko2, Takao Sasagawa1 (1.Tokyo Tech, 2.AIST)

Keywords:topological insulator, gate controle, device

Topological insulators are expected to be applied to electronic and spin devices as they have high mobility and spin-lifted bands. For application, control of surface electron conduction by gating is necessary. Since even a thin flake of a topological insulator has top/bottom surfaces which electric current go through, the necessity for Fermi surface control by multiple gate structures is beginning to be recognized. In this talk, the gate control of the surface conduction of the highly bulk-resistive topological insulator Sn-BSTS will be presented.