Crystallization of HfO<sub>2</sub> with pulsed laser annealing

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F206 (61-206)

Tomo Ueno(TUAT), Akio Ohta(Nagoya Univ.)

4:30 PM - 4:45 PM

〇(M1)Yuki Mori¹, Shigehisa Shibayama¹, Takeaki Yajima¹, Tomonori Nishimura¹, Shinji Migita², Akira Toriumi¹ (1.Univ. of Tokyo, 2.AIST)

Keywords:pulsed laser annealing, hafnia, HfO2