2018年第65回応用物理学会春季学術講演会

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一般セッション(口頭講演)

9 応用物性 » 9.3 ナノエレクトロニクス

[17p-F210-1~14] 9.3 ナノエレクトロニクス

2018年3月17日(土) 13:30 〜 17:15 F210 (61-210)

西口 克彦(NTT)

14:45 〜 15:00

[17p-F210-6] Analysis of High-Frequency Rectifying Characteristics of Single-Electron Transistor

〇(M1)Alka Singh1、Tomoki Nishimura1、Hiroaki Satoh1,2、Hiroshi Inokawa1,2 (1.GSIST, Shiz. Univ.、2.RIE, Shizuoka Univ.)

キーワード:Si- single electron transistor, High frequency rectifying characteristics

It has been reported experimentally that there seems nocutoff frequency in the rectifying operation of single electron transistor (SET). In order to understandthis, frequency dependence of the rectifying current is simulated, and theoretical explanation of the phenomena is attempted in this report.
The simulation is based on the time-dependent master equation considering the four states of electron number n in the SET island.
And finally after all the conclusion and analysis we concluded that, there is no cutoff frequency in the rectifyingoperation of SETs, and the asymmetry in thetunneling rate with respect to the drain voltage is
responsible at high frequencies.