The 65h JSAP Spring Meeting, 2018

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6 Thin Films and Surfaces » 6.3 Oxide electronics

[18a-C102-1~11] 6.3 Oxide electronics

Sun. Mar 18, 2018 9:00 AM - 12:00 PM C102 (52-102)

Yasushi Hirose(Univ. of Tokyo)

10:45 AM - 11:00 AM

△ [18a-C102-7] Fabrication and structural characterization of mist CVD-grown SnO2 thin films on YSZ(100) substrates

〇Yasuyuki Niwa1, Daisuke Kan1, Tomoyuki Koganezawa2, Yuichi Shimakawa1 (1.ICR, Kyoto Univ., 2.JASRI)

Keywords:mistCVD, oxide thin film