Effect of reactive-plasma deposition (RPD) process on the relationship between effective minority carrier lifetime and interface characteristics in ITO/SiO<sub>2</sub>/Si structures

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

Sun. Mar 18, 2018 9:00 AM - 11:45 AM D101 (56-101)

Toshie Kunii(Panasonic), Kazuyoshi Nakada(Tokyo Institute of Technology)

11:15 AM - 11:30 AM

〇(M1)Yuki Isogai¹, Takefumi Kamioka¹, Hyunju Lee¹, Nobuaki Kojima¹, Yoshio Ohshita¹ (1.TTI)

Keywords:RPD-ITO, lifetime, C-V analysis