The 65h JSAP Spring Meeting, 2018

Presentation information

Poster presentation

3 Optics and Photonics » 3.2 Equipment optics and materials

[18a-P2-1~9] 3.2 Equipment optics and materials

Sun. Mar 18, 2018 9:30 AM - 11:30 AM P2 (P)

9:30 AM - 11:30 AM

[18a-P2-5] Tolerance of radiation exposure on holographic polymer-dispersed liquid crystal

Akifumi Ogiwara1, Makishi Toda1, Minoru Watanabe2 (1.Kobe-C.C.T., 2.Shizuoka Univ.)

Keywords:liquid crystal, holographic memory, radiation

The radiation-hardened characteristics of holographic polymer-dispersed liquid crystal (HPDLC) memory are investigated for the applications requiring high reliability using an optically reconfigurable gate array. The optical properties and internal grating structures are investigated by using a cobalt 60 gamma radiation source to examine the resistance for more than 100 Mrad total-ionizing-dose.