[18a-P3-1~14] 7 Beam Technology and Nanofabrication（Poster）

▲ [18a-P3-9] X-ray optical sectioning microscopy: towards visulization of buried function layers and interfaces in thin films (II)

〇(D)Wenyang Zhao^1,2, Kenji Sakurai^2,1 (1.Tsukuba Univ., 2.NIMS)

Keywords:optical sectioning, buried function layers, microscopy

A new technique of X-ray optical sectioning microscopy is developed to non-destructively detect the exact position and depth of defects in periodically-packed multilayers, because the defects such as inhomogeneous impurity and layer distortion may dramatically decrease the performance of multilayer materials. It has been proved that this new technique of microscopy has a nano-level depth resolution and it is especially sensitive to buried function interface. It is going to be applied to many material systems such as magnets, optical-devices, Q-state semiconductors preparation, 2D materials and so on.
This poster discusses the technique details of X-ray optical sectioning microscopy. Necessary physics formula, data processing, instrumentation and routinized experimental procedures are also displayed.