The 65h JSAP Spring Meeting, 2018

Presentation information

Print

Symposium (Oral)

Symposium » Progress in studies on mterial conversion and processing with high-power lasers

[18p-A404-1~12] Progress in studies on mterial conversion and processing with high-power lasers

Sun. Mar 18, 2018 1:15 PM - 6:00 PM A404 (54-404)

Yoichiroh Hosokawa(NAIST), Masaaki Sakakura(Univ. of Southampton), Masayuki Kakehata(AIST)

3:00 PM - 3:30 PM

[18p-A404-5] High Power LPP-EUV Source with Long Collector Mirror Lifetime
for High Volume Semiconductor Manufacturing

〇Hakaru Mizoguchi1, Takashi Saitou1, Taku Yamazaki1 (1.Gigaphoton Inc.)

Keywords:Extreme Ultra Violet, Laser Produced Plasma, Lithography

We have been developing CO2-Sn-LPP EUV light source for HVM EUVL below 10nm node. We have proved high average power CO2 laser more than 27kW at output power cooperate with Mitsubishi electric cooperation for 250W EUV generation. We have demonstrated, EUV power recorded at100W level in burst stabilized, with 5% conversion efficiency, over 100hours continuous operation. Superior magnetic mitigation has demonstrated world level mirror degradation rate (= 0.4%/Gp) during 100W level operation. Deatail data will be report at presentation.