The 65h JSAP Spring Meeting, 2018

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6 Thin Films and Surfaces » 6.3 Oxide electronics

[18p-C102-1~16] 6.3 Oxide electronics

Sun. Mar 18, 2018 1:45 PM - 6:00 PM C102 (52-102)

Yasuhisa Naitoh(AIST), Shoso Shingubara(Kansai Univ.)

5:45 PM - 6:00 PM

△ [18p-C102-16] Oxygen composition and thickness dependences of electrical characteristics in Ta2O5-based ReRAM

〇Toshiki Miyatani1, Yusuke Nishi1, Tsunenobu Kimoto1 (1.Kyoto Univ.)

Keywords:ReRAM, reactive RF sputtering