The 65h JSAP Spring Meeting, 2018

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Symposium (Oral)

Symposium » Synthesis and plasma processing for 2D sheet materials -from ultra-thin films to atomically thin layered materials-

[18p-C204-1~9] Synthesis and plasma processing for 2D sheet materials -from ultra-thin films to atomically thin layered materials-

Sun. Mar 18, 2018 1:45 PM - 6:00 PM C204 (52-204)

Makoto Kambara(Univ. of Tokyo), Toshiaki Kato(Tohoku Univ.)

5:15 PM - 5:45 PM

[18p-C204-8] Formation of High-Mobility IGZO Thin Films with Plasma Enhanced Reactive Processes

〇Yuichi Setsuhara1, Masashi Endo1, Kosuke Takenaka1, Giichiro Uchida1, Akinori Ebe2 (1.Osaka Univ., 2.EMD Corp.)

Keywords:Oxide semiconductor, Sputtering