Deposition of Al<sub>1-x</sub>Ga<sub>x</sub>N films by sputtering

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

Sun. Mar 18, 2018 1:15 PM - 7:30 PM E202 (57-202)

Tsutomu Araki(Ritsumeikan Univ.), Ryuji Katayama(Osaka Univ.), Hajime Fujikura(SCIOCS)

4:15 PM - 4:30 PM

〇Ryo Ishikawa¹, Junjun Jia¹, Yuzo Shigesato¹ (1.Aoyama Gakuin Univ.)

Keywords:aluminum gallium nitride, sputtering, Vegard's law